Introduction
product details
(1) application: can be directly used for processing of high purity tantalum, tantalum ingot, or high
temperature alloy added directly to, or raw materials for preparation of high purity tantalum powder.
The preparation of CVD tantalum or evaporation material.
(2) product supply: the product has the characteristics of high purity, good plasticity and good
machinability, and easy to process.
(3) chemical composition
|
Chemical composition |
|||||||||
|
Grade |
Purity |
The flowing impurity no more than % |
|||||||
|
Ta |
Fe |
Si |
W |
Mo |
Ti |
Cr |
Cu |
Mn |
|
|
TTa-1 |
99.9% |
0.005% |
0.005% |
0.005% |
0.005% |
0.005% |
0.001% |
0.003% |
0.001% |
|
Nb |
C |
N |
O |
H |
Total impurity |
||||
|
0.05% |
0.01% |
0.005% |
0.02% |
0.001% |
<0.1% |
||||
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